Principles of Lithography, Second Edition (SPIE Press Monograph Vol. PM146)
| Author | : | |
| Rating | : | 4.18 (922 Votes) |
| Asin | : | 0819456608 |
| Format Type | : | paperback |
| Number of Pages | : | 438 Pages |
| Publish Date | : | 2018-01-02 |
| Language | : | English |
DESCRIPTION:
Dr. Harry J. He teaches courses in lithography science, process control, and total quality management. Levinson has worked in microlithography for nearly two decades, at companies such as IBM, Sierra Semiconductor, and Advanced Micro Devices. He has published many articles on lithography science, from thin film optical effects and metrics for imaging to overlay and process control.
Numerous references to the literature in optical lithograpy will guide both novice and experienced lithographers who want greater detail in specific areas. Several also appear in the first chapter of the SPIE Handbook on Microlithography, Micromachining, and Microfabrication, Volume I: Microlithography, which I coauthored with Bill Arnold of ASM Lithography. Students in my classes on lithography science will recognize many of the figures and equations. From the Author This book is intended as an introduction to the science of microlithography for those new to the subject, and it covers advanced topics useful to experienced lithographers who seek information outside their own areas of expertise. Some knowledge of resist chem
Edward H. Sebesta said Review of "Principles of Lithography," "Review of "Principles of Lithography," 2nd edition by Harry J. Levinson." according to Edward H. Sebesta. This is an excellent book for engineers, whether in photolithography or not, to acquire an overview and understanding of modern deep sub-micron photolithography and the challenges microlithographers face. It is well written and easy to read. Levinson takes you through the entire process of lithography step by step with both the mathematics involved, but also, an intuitive explanation of what the technical issues involved are. The drawings done for the. nd edition by Harry J. Levinson.. This is an excellent book for engineers, whether in photolithography or not, to acquire an overview and understanding of modern deep sub-micron photolithography and the challenges microlithographers face. It is well written and easy to read. Levinson takes you through the entire process of lithography step by step with both the mathematics involved, but also, an intuitive explanation of what the technical issues involved are. The drawings done for the. Four Stars Great book.
This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. No topics will require knowledge of mathematics beyond elementary calculus.Contents - Preface - Overview of lithography - Optical pattern formation - Photoresists - Modeling and thin film effects - Wafer steppers - Color Plates overlay - Masks and reticules - Overcoming the diffraction limit - Metrology - The limits of optical lithography - Lithography costs - Alternative lithography techniques - Appendix A: Coherence - Index. Lithography is a field in which advances pr